{"id":1801,"date":"2026-04-07T15:56:08","date_gmt":"2026-04-07T07:56:08","guid":{"rendered":"https:\/\/jeez-semicon.com\/?p=1801"},"modified":"2026-04-07T16:29:48","modified_gmt":"2026-04-07T08:29:48","slug":"custom-cmp-polishing-pad-solutions-from-specification-to-production","status":"publish","type":"post","link":"https:\/\/jeez-semicon.com\/de\/blog\/custom-cmp-polishing-pad-solutions-from-specification-to-production\/","title":{"rendered":"Custom CMP Polishing Pad Solutions: From Specification to Production"},"content":{"rendered":"<!-- ============================================================\n     CLUSTER 15 \u2014 Custom CMP Polishing Pad Solutions | Jizhi Electronic Technology | April 2026 | \/blog\/Custom-CMP-Polishing-Pad-Solutions\n     ============================================================ -->\n<style>\n@import url('https:\/\/fonts.googleapis.com\/css2?family=Sora:wght@300;400;500;600;700&family=IBM+Plex+Mono:wght@400;500&display=swap');\n:root{--c-surface:#ffffff;--c-border:#e2e6ef;--c-primary:#0b3d91;--c-primary-dark:#072d6e;--c-accent:#0090d4;--c-accent-light:#e6f5fd;--c-gold:#c8910a;--c-gold-light:#fdf5e0;--c-text:#1a1f2e;--c-muted:#5a6278;--c-tag-bg:#c8d9f5;--c-tag-text:#0a2057;--c-tag-border:#8aaee0;--radius:10px;--radius-lg:16px;--shadow-card:0 2px 12px rgba(11,61,145,.07);--shadow-hover:0 6px 28px rgba(11,61,145,.13);--font-body:'Sora',sans-serif;--font-mono:'IBM Plex Mono',monospace;--max-w:860px}\n.jz-art *{box-sizing:border-box;margin:0;padding:0}\n.jz-art{font-family:var(--font-body);color:var(--c-text);background:transparent;line-height:1.75;font-size:16px;max-width:var(--max-w);margin:0 auto}\n.jz-art a{color:var(--c-accent);text-decoration:none;transition:color .2s}\n.jz-art a:hover{color:var(--c-primary);text-decoration:underline}\n.jz-hero{background:linear-gradient(135deg,#072d6e 0%,#0b3d91 45%,#0a5db5 100%);border-radius:var(--radius-lg);padding:52px 48px 48px;margin-bottom:40px;position:relative;overflow:hidden}\n.jz-hero::before{content:'';position:absolute;right:-60px;top:-60px;width:340px;height:340px;background:rgba(0,144,212,.18);border-radius:50%}\n.jz-hero::after{content:'';position:absolute;right:80px;bottom:-80px;width:200px;height:200px;background:rgba(0,144,212,.10);border-radius:50%}\n.jz-hero-kicker{font-family:var(--font-mono);font-size:12px;letter-spacing:.12em;text-transform:uppercase;color:rgba(255,255,255,.75);margin-bottom:14px}\n.jz-hero h1{font-size:clamp(24px,4vw,38px);font-weight:700;color:#fff;line-height:1.22;margin-bottom:18px;position:relative;z-index:1}\n.jz-hero-lead{font-size:17px;color:rgba(255,255,255,.90);line-height:1.72;max-width:620px;position:relative;z-index:1;margin-bottom:28px}\n.jz-hero-meta{display:flex;flex-wrap:wrap;gap:20px;font-size:13px;color:rgba(255,255,255,.90);position:relative;z-index:1}\n.jz-hero-meta span{display:flex;align-items:center;gap:6px}\n.jz-tags{display:flex;flex-wrap:wrap;gap:8px;margin-bottom:36px}\n.jz-tag{background:var(--c-tag-bg);color:var(--c-tag-text);font-size:12px;font-weight:700;padding:4px 14px;border-radius:20px;border:1px solid var(--c-tag-border);letter-spacing:.01em}\n.jz-back{display:inline-flex;align-items:center;gap:7px;font-size:13px;font-family:var(--font-mono);color:var(--c-muted);margin-bottom:28px;padding:8px 14px;background:var(--c-surface);border:1px solid var(--c-border);border-radius:6px;text-decoration:none;transition:border-color .2s,color .2s}\n.jz-back:hover{border-color:var(--c-accent);color:var(--c-accent);text-decoration:none}\n.jz-back::before{content:'\u2190';font-size:13px}\n.jz-toc{background:var(--c-surface);border:1px solid var(--c-border);border-left:4px solid var(--c-primary);border-radius:var(--radius);padding:28px 32px;margin-bottom:44px;box-shadow:var(--shadow-card)}\n.jz-toc-title{font-size:14px;font-weight:600;text-transform:uppercase;letter-spacing:.08em;color:var(--c-primary);margin-bottom:16px;font-family:var(--font-mono)}\n.jz-toc ol{padding-left:20px;display:grid;grid-template-columns:1fr 1fr;gap:4px 32px}\n.jz-toc ol li{font-size:14px;line-height:1.65;color:var(--c-muted)}\n.jz-toc ol li a{color:var(--c-primary);font-weight:500}\n.jz-toc ol li a:hover{color:var(--c-accent)}\n@media(max-width:620px){.jz-toc ol{grid-template-columns:1fr}}\n.jz-art h2{font-size:clamp(20px,3vw,26px);font-weight:700;color:var(--c-primary-dark);line-height:1.3;margin:52px 0 16px;padding-top:8px;border-top:2px solid var(--c-border)}\n.jz-art h3{font-size:18px;font-weight:600;color:var(--c-text);margin:28px 0 10px}\n.jz-art h4{font-size:16px;font-weight:600;color:var(--c-primary);margin:20px 0 8px}\n.jz-art p{margin-bottom:18px;color:#1e2435}\n.jz-art ul,.jz-art ol{margin-bottom:18px;padding-left:22px;color:#1e2435}\n.jz-art li{margin-bottom:7px;line-height:1.7}\n.jz-callout{border-radius:var(--radius);padding:20px 24px;margin:28px 0;display:flex;gap:16px;align-items:flex-start}\n.jz-callout-icon{font-size:22px;flex-shrink:0;margin-top:1px}\n.jz-callout-body{flex:1;font-size:15px;line-height:1.65;color:#1e2435}\n.jz-callout-body strong{display:block;font-weight:600;margin-bottom:4px;font-size:14px;color:#1a1f2e}\n.jz-callout.info{background:#e8f4fd;border-left:4px solid var(--c-accent)}\n.jz-callout.tip{background:var(--c-gold-light);border-left:4px solid var(--c-gold)}\n.jz-callout.warn{background:#fff4e5;border-left:4px solid #e07b00}\n.jz-callout.success{background:#eaf5ee;border-left:4px solid #2e9e55}\n.jz-callout.cta{background:linear-gradient(135deg,#e8f4fd,#edf1fb);border-left:4px solid var(--c-primary)}\n.jz-table-wrap{overflow-x:auto;margin:28px 0;border-radius:var(--radius);box-shadow:var(--shadow-card)}\n.jz-table{width:100%;border-collapse:collapse;font-size:14px;background:var(--c-surface)}\n.jz-table thead th{background:var(--c-primary);color:#fff;font-weight:600;padding:12px 16px;text-align:left;font-size:13px;letter-spacing:.03em}\n.jz-table tbody tr:nth-child(even){background:#f3f6fc}\n.jz-table tbody td{padding:11px 16px;border-bottom:1px solid var(--c-border);color:#1e2435;vertical-align:top;line-height:1.6}\n.jz-table tbody tr:hover td{background:#eaf0fb}\n.jz-table .win{color:#1a6e35;font-weight:600}\n.jz-table .mid{color:#7a5c00;font-weight:500}\n.jz-table .lose{color:#963a00;font-weight:500}\n.jz-card-grid{display:grid;grid-template-columns:repeat(auto-fit,minmax(210px,1fr));gap:20px;margin:28px 0}\n.jz-card{background:var(--c-surface);border:1px solid var(--c-border);border-radius:var(--radius);padding:22px 20px;box-shadow:var(--shadow-card);transition:transform .22s,box-shadow .22s}\n.jz-card:hover{transform:translateY(-3px);box-shadow:var(--shadow-hover)}\n.jz-card-icon{font-size:26px;margin-bottom:12px}\n.jz-card h4{font-size:15px;font-weight:600;color:var(--c-primary-dark);margin-bottom:8px}\n.jz-card p{font-size:14px;color:var(--c-muted);line-height:1.6;margin-bottom:0}\n.jz-steps{display:flex;flex-direction:column;gap:0;margin:28px 0}\n.jz-step{display:flex;gap:20px;padding:22px 0;border-bottom:1px solid var(--c-border)}\n.jz-step:last-child{border-bottom:none}\n.jz-step-num{flex-shrink:0;width:40px;height:40px;background:var(--c-primary);color:#fff;border-radius:50%;display:flex;align-items:center;justify-content:center;font-weight:700;font-size:15px;margin-top:2px}\n.jz-step-body h4{font-size:16px;font-weight:600;color:#1a1f2e;margin-bottom:7px}\n.jz-step-body p{font-size:15px;color:#3a4255;margin-bottom:0;line-height:1.7}\n.jz-two-col{display:grid;grid-template-columns:1fr 1fr;gap:24px;margin:28px 0}\n@media(max-width:600px){.jz-two-col{grid-template-columns:1fr}}\n.jz-col-box{background:var(--c-surface);border:1px solid var(--c-border);border-radius:var(--radius);padding:22px 20px;box-shadow:var(--shadow-card)}\n.jz-col-box h4{font-size:15px;font-weight:600;margin-bottom:10px;color:var(--c-primary-dark)}\n.jz-col-box ul{padding-left:18px}\n.jz-col-box ul li{font-size:14px;color:#3a4255;margin-bottom:7px;line-height:1.6}\n.jz-stats{display:grid;grid-template-columns:repeat(auto-fit,minmax(148px,1fr));gap:16px;margin:28px 0}\n.jz-stat{background:var(--c-surface);border:1px solid var(--c-border);border-radius:var(--radius);padding:18px 16px;text-align:center;box-shadow:var(--shadow-card)}\n.jz-stat-num{font-size:26px;font-weight:700;color:var(--c-primary);font-family:var(--font-mono);line-height:1}\n.jz-stat-label{font-size:12px;color:var(--c-muted);margin-top:6px;line-height:1.4}\n.jz-trust{background:#f0f4ff;border-radius:var(--radius);padding:20px 24px;display:flex;align-items:center;gap:18px;margin:40px 0;border:1px solid #d0daee}\n.jz-trust-badge{background:var(--c-primary);color:#fff;border-radius:8px;padding:10px 14px;font-size:12px;font-weight:700;text-align:center;line-height:1.3;flex-shrink:0;font-family:var(--font-mono)}\n.jz-trust-text{font-size:14px;color:#3a4255;line-height:1.65}\n.jz-trust-text strong{color:var(--c-text)}\n.jz-link-chip{display:inline-flex;align-items:center;gap:5px;background:var(--c-accent-light);color:var(--c-accent);font-size:13px;font-weight:500;padding:3px 11px 3px 8px;border-radius:20px;border:1px solid #b3ddf5;text-decoration:none;transition:background .2s,color .2s}\n.jz-link-chip:hover{background:var(--c-accent);color:#fff;text-decoration:none}\n.jz-link-chip::before{content:'\u2192';font-size:11px}\n.jz-related{background:var(--c-surface);border:1px solid var(--c-border);border-radius:var(--radius-lg);padding:32px 32px 28px;margin:48px 0 32px;box-shadow:var(--shadow-card)}\n.jz-related-title{font-size:14px;font-weight:600;text-transform:uppercase;letter-spacing:.08em;color:var(--c-primary);margin-bottom:20px;font-family:var(--font-mono)}\n.jz-related-grid{display:grid;grid-template-columns:repeat(auto-fill,minmax(230px,1fr));gap:14px}\n.jz-related-item{background:#f3f6fc;border-radius:8px;padding:14px 16px;border:1px solid var(--c-border);transition:background .2s,box-shadow .2s}\n.jz-related-item:hover{background:var(--c-accent-light);box-shadow:var(--shadow-card)}\n.jz-related-item a{font-size:14px;font-weight:500;color:var(--c-primary);text-decoration:none;line-height:1.45;display:block}\n.jz-related-item a:hover{color:var(--c-accent);text-decoration:none}\n.jz-related-cat{font-size:11px;font-family:var(--font-mono);color:var(--c-muted);margin-bottom:5px;letter-spacing:.05em}\n.jz-cta-banner{background:linear-gradient(135deg,#072d6e 0%,#0b3d91 60%,#0a5db5 100%);border-radius:var(--radius-lg);padding:44px 40px;text-align:center;margin:48px 0;position:relative;overflow:hidden}\n.jz-cta-banner::before{content:'';position:absolute;left:-40px;top:-40px;width:220px;height:220px;background:rgba(0,144,212,.15);border-radius:50%}\n.jz-cta-banner h2{color:#fff;font-size:clamp(20px,3vw,28px);margin-bottom:12px;border:none;padding-top:0;position:relative;z-index:1}\n.jz-cta-banner p{color:rgba(255,255,255,.90);font-size:16px;margin-bottom:28px;position:relative;z-index:1}\n.jz-btn{display:inline-block;padding:13px 32px;border-radius:8px;font-weight:600;font-size:15px;text-decoration:none;transition:transform .2s,box-shadow .2s}\n.jz-btn:hover{transform:translateY(-2px);text-decoration:none}\n.jz-btn-white{background:#fff;color:var(--c-primary)}\n.jz-btn-white:hover{box-shadow:0 4px 20px rgba(0,0,0,.18);color:var(--c-primary)}\n.jz-btn-outline{background:transparent;color:#fff;border:2px solid rgba(255,255,255,.6);margin-left:12px}\n.jz-btn-outline:hover{background:rgba(255,255,255,.12);color:#fff}\n.jz-faq{margin:28px 0}\n.jz-faq-item{border:1px solid var(--c-border);border-radius:var(--radius);margin-bottom:12px;overflow:hidden;background:var(--c-surface)}\n.jz-faq-q{padding:16px 20px;font-weight:600;font-size:15px;color:var(--c-primary-dark);display:flex;justify-content:space-between;align-items:center}\n.jz-faq-q::after{content:'+';font-size:20px;font-weight:300;color:var(--c-accent);flex-shrink:0}\n.jz-faq-a{padding:0 20px 16px;font-size:15px;color:#3a4255;line-height:1.75}\n@media(max-width:640px){.jz-hero{padding:36px 24px 32px}.jz-cta-banner{padding:32px 22px}.jz-related{padding:24px 18px}.jz-btn-outline{margin-left:0;margin-top:10px;display:inline-block}}\n<\/style>\n\n<div class=\"jz-art\">\n<a class=\"jz-back\" href=\"https:\/\/jeez-semicon.com\/de\/blog\/CMP-Polishing-Pads-The-Complete-Guide\/\" target=\"_blank\">Back to CMP Polishing Pads: The Complete Guide<\/a>\n\n<div class=\"jz-hero\">\n  <div class=\"jz-hero-kicker\">Jizhi Electronic Technology \u2014 Customization Series<\/div>\n  <p class=\"jz-hero-lead\">A complete guide to custom CMP polishing pad development at Jizhi Electronic Technology \u2014 covering when customization is necessary, what parameters can be specified, the co-development process timeline, qualification requirements, and how to initiate a custom pad project.<\/p>\n  <div class=\"jz-hero-meta\">\n    <span>\ud83d\udcc5 April 2026<\/span>\n    <span>\u23f1 12 min read<\/span>\n    <span>\ud83c\udfed Jizhi Electronic Technology Co., Ltd.<\/span>\n  <\/div>\n<\/div>\n\n<div class=\"jz-tags\">\n  <span class=\"jz-tag\">Custom CMP Pad<\/span>\n  <span class=\"jz-tag\">OEM Polishing Pad<\/span>\n  <span class=\"jz-tag\">CMP Pad Development<\/span>\n  <span class=\"jz-tag\">Specialty Pad<\/span>\n  <span class=\"jz-tag\">Pad Formulation<\/span>\n  <span class=\"jz-tag\">Co-Development<\/span>\n  <span class=\"jz-tag\">R&amp;D Partnership<\/span>\n<\/div>\n\n<div class=\"jz-trust\">\n  <div class=\"jz-trust-badge\">Benutzerdefiniert<br>R&amp;D<\/div>\n  <div class=\"jz-trust-text\"><strong>Written by Jizhi Electronic Technology Co., Ltd.<\/strong> \u2014 CMP pad manufacturer with in-house R&amp;D capability for custom formulation, groove design, and application development. Custom pad development services active as of April 2026.<\/div>\n<\/div>\n\n<div class=\"jz-toc\">\n  <div class=\"jz-toc-title\">\ud83d\udccb Inhaltsverzeichnis<\/div>\n  <ol>\n    <li><a href=\"#when-custom\">When Standard Pads Are Not Enough<\/a><\/li>\n    <li><a href=\"#what-customizable\">What Can Be Customized<\/a><\/li>\n    <li><a href=\"#custom-applications\">Custom Pad Application Examples<\/a><\/li>\n    <li><a href=\"#development-process\">The Co-Development Process<\/a><\/li>\n    <li><a href=\"#timeline\">Development Timeline and Milestones<\/a><\/li>\n    <li><a href=\"#qualification\">Qualification and Production Transition<\/a><\/li>\n    <li><a href=\"#ip-protection\">IP Protection in Co-Development<\/a><\/li>\n    <li><a href=\"#faq\">FAQ<\/a><\/li>\n  <\/ol>\n<\/div>\n\n<p>The vast majority of CMP polishing pad requirements in semiconductor manufacturing can be met by catalog products \u2014 standard hard polyurethane pads for oxide and tungsten CMP, soft subpads for copper BEOL, and SiC-specific formulations for power device substrates. But a significant and growing segment of CMP applications falls outside what standard catalog products can address: novel substrate materials, non-standard wafer geometries, extremely aggressive slurry chemistries, ultra-precise hardness targets for specialized uniformity requirements, or proprietary groove patterns designed around specific tool configurations.<\/p>\n\n<p>Jizhi Electronic Technology&#8217;s custom CMP pad development program provides the full range of customization services \u2014 from minor parameter adjustments (specific hardness within a formulation family, custom groove pitch) to ground-up development of new polymer formulations for materials not previously polished with CMP. This guide explains when custom pads are the right solution, what the development process looks like, and how to initiate a project.<\/p>\n\n<h2 id=\"when-custom\">1. When Standard Pads Are Not Enough<\/h2>\n<p>Custom pad development is warranted \u2014 and the economics justify it \u2014 in the following situations:<\/p>\n\n<div class=\"jz-card-grid\">\n  <div class=\"jz-card\">\n    <div class=\"jz-card-icon\">\ud83d\udc8e<\/div>\n    <h4>Novel Substrate Materials<\/h4>\n    <p>Materials not addressed by standard pad portfolios: gallium oxide (Ga\u2082O\u2083), diamond substrates, aluminum nitride (AlN), lithium niobate (LiNbO\u2083), or other wide-bandgap or piezoelectric substrates where chemical inertness, hardness, or crystal fragility falls outside the design envelope of existing pads.<\/p>\n  <\/div>\n  <div class=\"jz-card\">\n    <div class=\"jz-card-icon\">\ud83d\udcd0<\/div>\n    <h4>Non-Standard Wafer Geometries<\/h4>\n    <p>Square substrates, hexagonal dies, panel formats (for panel-level packaging), or non-standard circular diameters (e.g., 125 mm, 175 mm, or square panels up to 300\u00d7300 mm) that standard pad punching and machining cannot accommodate without custom tooling.<\/p>\n  <\/div>\n  <div class=\"jz-card\">\n    <div class=\"jz-card-icon\">\ud83e\uddea<\/div>\n    <h4>Proprietary or Extreme Slurry Chemistry<\/h4>\n    <p>Slurry systems using oxidizers or pH ranges that degrade standard polyurethane formulations within a single pad lifetime \u2014 for example, very high-concentration Fenton reagents for SiC, or strongly alkaline (pH &gt;12) chemistries for specific dielectric films.<\/p>\n  <\/div>\n  <div class=\"jz-card\">\n    <div class=\"jz-card-icon\">\ud83c\udfaf<\/div>\n    <h4>Ultra-Precise Hardness Targets<\/h4>\n    <p>Applications where the optimal hardness window is very narrow \u2014 for example, a specific hybrid bonding surface preparation requiring exactly Shore D 32\u201336 (within a range that standard soft pad families straddle but do not hit precisely) for a particular incoming film stack.<\/p>\n  <\/div>\n  <div class=\"jz-card\">\n    <div class=\"jz-card-icon\">\ud83d\udd27<\/div>\n    <h4>Custom Groove Patterns for Specific Tools<\/h4>\n    <p>Non-standard CMP tools (legacy equipment, research-grade tools, custom-built systems) with platen geometries, slurry delivery configurations, or carrier arm geometries that standard groove patterns do not optimize for \u2014 requiring CFD-modeled custom groove designs.<\/p>\n  <\/div>\n  <div class=\"jz-card\">\n    <div class=\"jz-card-icon\">\ud83c\udff7\ufe0f<\/div>\n    <h4>OEM Private-Label Requirements<\/h4>\n    <p>Equipment OEMs or system integrators who supply CMP-related tools or sub-systems and require pads supplied under their own brand name with specific formulation ownership or exclusivity arrangements.<\/p>\n  <\/div>\n<\/div>\n\n<h2 id=\"what-customizable\">2. What Can Be Customized in a Jizhi CMP Pad<\/h2>\n\n<div class=\"jz-table-wrap\">\n  <table class=\"jz-table\">\n    <thead><tr><th>Parameter Category<\/th><th>Customizable Range<\/th><th>Typical Development Time<\/th><th>Minimum Order<\/th><\/tr><\/thead>\n    <tbody>\n      <tr><td><strong>Shore D hardness target<\/strong><\/td><td>Any value Shore D 24\u201372, in increments as fine as \u00b12 Shore D<\/td><td>4\u20138 weeks (within existing formulation family)<\/td><td>20 pads<\/td><\/tr>\n      <tr><td><strong>Groove pattern<\/strong><\/td><td>Any standard or custom pattern; zone-varying pitch; custom depth and width profiles<\/td><td>2\u20134 weeks (machining program only); 6\u201310 weeks (CFD-optimized)<\/td><td>20 pads<\/td><\/tr>\n      <tr><td><strong>Pad diameter and thickness<\/strong><\/td><td>Diameter: 100 mm to 800 mm. Thickness: 1.0\u20134.0 mm. Square pads up to 600\u00d7600 mm.<\/td><td>2\u20134 weeks (tooling adjustment)<\/td><td>10 pads<\/td><\/tr>\n      <tr><td><strong>Polyol backbone type<\/strong><\/td><td>Polyether, polyester, polycarbonate, polysiloxane-modified<\/td><td>8\u201316 weeks (formulation + curing + characterization)<\/td><td>50 pads<\/td><\/tr>\n      <tr><td><strong>Pore size and density<\/strong><\/td><td>Mean diameter 15\u201380 \u00b5m; volume fraction 5\u201335%; or poreless<\/td><td>8\u201316 weeks<\/td><td>50 pads<\/td><\/tr>\n      <tr><td><strong>Chemical resistance package<\/strong><\/td><td>Immersion resistance testing against customer-specified slurry chemistry at process temperature<\/td><td>4\u20138 weeks<\/td><td>20 pads<\/td><\/tr>\n      <tr><td><strong>Backing layer specification<\/strong><\/td><td>PET, polyurethane foam, no backing, or multi-layer laminate<\/td><td>2\u20134 weeks<\/td><td>20 pads<\/td><\/tr>\n      <tr><td><strong>Private label \/ OEM branding<\/strong><\/td><td>Custom product code, customer logo, customer-specific documentation format<\/td><td>2\u20134 weeks (packaging\/documentation only)<\/td><td>100 pads\/year<\/td><\/tr>\n    <\/tbody>\n  <\/table>\n<\/div>\n\n<h2 id=\"custom-applications\">3. Custom Pad Application Examples<\/h2>\n<p>The following examples illustrate the types of custom pad projects Jizhi has undertaken or is currently engaged in as of April 2026:<\/p>\n\n<ul>\n  <li><strong>Ga\u2082O\u2083 substrate final CMP:<\/strong> Gallium oxide (Mohs 7.5) is emerging as a power device substrate for ultra-high-voltage applications. Its chemical inertness to common oxidizers and sensitivity to phosphoric acid-based etching required a custom pad formulation with phosphoric acid resistance, combined with a very soft compliance profile (Shore D 32) to minimize sub-surface damage in the fragile Ga\u2082O\u2083 crystal. Development completed in 14 weeks; production samples provided to customer research lab in Q1 2026.<\/li>\n  <li><strong>Panel-level fan-out packaging Cu RDL:<\/strong> A panel format of 300\u00d7300 mm (non-standard) with a glass substrate required a custom pad punched to panel dimensions and a very soft (Shore D 28) formulation to accommodate the glass panel&#8217;s low stiffness without edge-loading artifacts. Custom backing layer (no subpad, direct PSA to panel tool chuck) was also required. Development completed in 10 weeks.<\/li>\n  <li><strong>High-concentration KMnO\u2084 SiC CMP:<\/strong> A research customer required a pad compatible with KMnO\u2084 concentrations up to 5 wt% for experimental high-MRR SiC polishing research. Standard polycarbonate-PU formulations showed hardness degradation after 4 hours at this concentration. A polysiloxane-modified PU formulation was developed that maintained Shore D 65\u00b12 after 24-hour immersion in 5 wt% KMnO\u2084 at 60\u00b0C. Development completed in 18 weeks.<\/li>\n  <li><strong>OEM private-label for CMP tool manufacturer:<\/strong> A CMP equipment OEM required pads supplied under their own brand for their tool&#8217;s consumables kit. Jizhi manufactures the JZ-H60-equivalent pad to the OEM&#8217;s specification with the OEM&#8217;s product code and labeling, delivered in OEM-branded packaging. Exclusivity arrangement covers the OEM&#8217;s specific tool model series.<\/li>\n<\/ul>\n\n<h2 id=\"development-process\">4. The Co-Development Process<\/h2>\n\n<div class=\"jz-steps\">\n  <div class=\"jz-step\">\n    <div class=\"jz-step-num\">1<\/div>\n    <div class=\"jz-step-body\">\n      <h4>Application Assessment Call (Week 1)<\/h4>\n      <p>A 60-minute technical call between the customer&#8217;s process engineering team and Jizhi&#8217;s R&amp;D team to characterize the application: substrate material, wafer geometry, slurry chemistry (including oxidizer type and concentration, pH, abrasive type), CMP tool model, target MRR, WIWNU requirement, defect density budget, and any known previous approaches and their failure modes. This call determines whether a catalog product can address the requirement or genuine custom development is needed.<\/p>\n    <\/div>\n  <\/div>\n  <div class=\"jz-step\">\n    <div class=\"jz-step-num\">2<\/div>\n    <div class=\"jz-step-body\">\n      <h4>Technical Feasibility Assessment and Proposal (Weeks 2\u20134)<\/h4>\n      <p>Jizhi&#8217;s materials team assesses the feasibility of the requested customization, including any polymer chemistry challenges, chemical compatibility risks, and geometry\/tooling constraints. A written development proposal is issued covering: proposed formulation approach, development timeline, sample milestones, pricing for development samples and production supply, and IP ownership terms. Customer review and approval required before development begins.<\/p>\n    <\/div>\n  <\/div>\n  <div class=\"jz-step\">\n    <div class=\"jz-step-num\">3<\/div>\n    <div class=\"jz-step-body\">\n      <h4>Formulation Development and Initial Characterization (Weeks 4\u201314, application-dependent)<\/h4>\n      <p>Jizhi&#8217;s R&amp;D team formulates and cures prototype pad samples, performing in-house characterization: Shore D mapping, DMA (Tg measurement), chemical resistance immersion testing at customer&#8217;s slurry conditions, and pore size distribution analysis. Multiple formulation iterations may be performed to hit the target property window. Customer receives characterization data at each milestone for review and input.<\/p>\n    <\/div>\n  <\/div>\n  <div class=\"jz-step\">\n    <div class=\"jz-step-num\">4<\/div>\n    <div class=\"jz-step-body\">\n      <h4>Sample Delivery and Customer Process Evaluation (Weeks 14\u201322)<\/h4>\n      <p>Development sample pads (typically 3\u20135 units) are shipped to the customer for process evaluation on their specific tool and application. Jizhi provides recommended process recipe (pressure, velocity, slurry flow rate, conditioning protocol) and a characterization data sheet for each sample lot. Customer evaluates removal rate, WIWNU, and defect density and provides feedback.<\/p>\n    <\/div>\n  <\/div>\n  <div class=\"jz-step\">\n    <div class=\"jz-step-num\">5<\/div>\n    <div class=\"jz-step-body\">\n      <h4>Iteration and Refinement (Weeks 22\u201330, if needed)<\/h4>\n      <p>Based on customer process evaluation results, Jizhi adjusts formulation parameters \u2014 hardness, pore loading, groove geometry \u2014 to optimize performance. A second or third sample iteration may be required for demanding applications. The iteration cycle time is typically 4\u20136 weeks per iteration, shorter than the initial development cycle because the formulation baseline is established.<\/p>\n    <\/div>\n  <\/div>\n  <div class=\"jz-step\">\n    <div class=\"jz-step-num\">6<\/div>\n    <div class=\"jz-step-body\">\n      <h4>Production Formulation Lock and Scale-Up (Weeks 30\u201338)<\/h4>\n      <p>Once the customer approves a sample iteration, Jizhi locks the formulation (fixed raw material specifications, processing parameters, and QC acceptance criteria) and scales to production batch sizes. First production lot characterization data is submitted to the customer for final approval before production release.<\/p>\n    <\/div>\n  <\/div>\n<\/div>\n\n<h2 id=\"timeline\">5. Development Timeline by Customization Complexity<\/h2>\n<div class=\"jz-table-wrap\">\n  <table class=\"jz-table\">\n    <thead><tr><th>Customization Type<\/th><th>Typical Timeline to First Sample<\/th><th>Typical Timeline to Production<\/th><\/tr><\/thead>\n    <tbody>\n      <tr><td>Groove pattern only (standard formulation)<\/td><td class=\"win\">2\u20134 weeks<\/td><td class=\"win\">4\u20136 weeks<\/td><\/tr>\n      <tr><td>Hardness adjustment within existing formulation family<\/td><td class=\"win\">4\u20138 weeks<\/td><td class=\"win\">8\u201312 weeks<\/td><\/tr>\n      <tr><td>Pore size or loading modification<\/td><td>8\u201312 weeks<\/td><td>12\u201318 weeks<\/td><\/tr>\n      <tr><td>Polyol backbone substitution (same isocyanate)<\/td><td>10\u201316 weeks<\/td><td>18\u201324 weeks<\/td><\/tr>\n      <tr><td>Ground-up formulation for novel substrate\/chemistry<\/td><td class=\"lose\">16\u201324 weeks<\/td><td class=\"lose\">26\u201336 weeks<\/td><\/tr>\n      <tr><td>OEM private label (existing product, packaging\/docs only)<\/td><td class=\"win\">2\u20133 weeks<\/td><td class=\"win\">3\u20134 weeks<\/td><\/tr>\n    <\/tbody>\n  <\/table>\n<\/div>\n\n<h2 id=\"qualification\">6. Qualification and Production Transition<\/h2>\n<p>Custom pads follow the same qualification protocol as standard pads \u2014 the customer performs process qualification on their tool using the approved development sample specification as the baseline, then verifies that the first production lot meets the same acceptance criteria. Jizhi locks the production formulation after the first production lot is approved by the customer and issues a signed formulation lock document that defines the specification baseline for all future production lots.<\/p>\n\n<p>Change control for custom pad formulations is strictly managed: any change to raw material supplier, polymer formulation, pore-forming agent type, or machining process requires written notification to the customer at least 90 days in advance and customer approval before implementation. This provides the same change control protection that customers receive from qualification of standard products.<\/p>\n\n<h2 id=\"ip-protection\">7. IP Protection in Co-Development<\/h2>\n<p>Custom pad co-development inherently involves sharing technical information between Jizhi and the customer. Our standard co-development agreements include the following IP protections:<\/p>\n<ul>\n  <li><strong>Customer application IP:<\/strong> All information the customer provides about their substrate material, slurry chemistry, process targets, and device application is treated as confidential and protected by a mutual NDA signed before any technical discussion begins.<\/li>\n  <li><strong>Jizhi formulation IP:<\/strong> The specific polyurethane formulation developed for a custom application remains Jizhi&#8217;s IP unless explicitly agreed otherwise. Customers receive the right to purchase pads made to that formulation for their specified application.<\/li>\n  <li><strong>Exclusivity options:<\/strong> Customers requiring exclusive access to a specific custom formulation (i.e., Jizhi will not supply the same formulation to competitors) can negotiate exclusivity arrangements. Exclusivity is application-specific, not formulation-specific in general.<\/li>\n  <li><strong>Co-inventions:<\/strong> Where development work generates patentable innovations jointly conceived by both parties, co-ownership arrangements are negotiated in the development agreement before work begins.<\/li>\n<\/ul>\n\n<h2>8. Frequently Asked Questions<\/h2>\n<div class=\"jz-faq\">\n  <div class=\"jz-faq-item\">\n    <div class=\"jz-faq-q\">What is the minimum order quantity for a custom pad development project?<\/div>\n    <div class=\"jz-faq-a\">Minimum order quantities depend on customization type. For groove-pattern-only customization of a standard formulation, the minimum is 20 pads. For formulation development (new polyol backbone, modified pore structure), the minimum production commitment is typically 50 pads per order after qualification, with a minimum annual volume of 200 pads to justify the formulation development investment. For OEM private-label of existing products, the minimum annual volume is 100 pads. These minimums are negotiable for academic and research institution customers conducting pioneering work on new materials.<\/div>\n  <\/div>\n  <div class=\"jz-faq-item\">\n    <div class=\"jz-faq-q\">Does Jizhi charge for the development work itself?<\/div>\n    <div class=\"jz-faq-a\">Development pricing depends on complexity. For minor customizations (groove pattern, hardness adjustment within an existing family), development cost is typically absorbed into the sample pad unit price \u2014 no separate development fee. For major formulation development (new polyol backbone, novel substrate application), a development fee of $5,000\u2013$25,000 USD covers materials, R&amp;D labor, and characterization for the development phase. This fee is typically credited against the first production order when the customer commits to a volume supply agreement. Contact our team to discuss the appropriate arrangement for your specific project.<\/div>\n  <\/div>\n  <div class=\"jz-faq-item\">\n    <div class=\"jz-faq-q\">Can Jizhi develop a pad for a material other than silicon or SiC?<\/div>\n    <div class=\"jz-faq-a\">Yes \u2014 Jizhi&#8217;s R&amp;D capability extends to any substrate material that can be processed using CMP or CMP-adjacent polishing techniques. We have development experience with SiC, GaN, sapphire, glass, quartz, and have initiated feasibility studies on Ga\u2082O\u2083 and diamond substrates. The fundamental question for any new material is whether a viable chemical passivation mechanism exists \u2014 without some form of chemical softening of the surface, purely mechanical abrasion of ultra-hard materials is too slow and too damaging for practical use. Our materials team will assess the chemical passivation options for your substrate in the feasibility assessment phase.<\/div>\n  <\/div>\n  <div class=\"jz-faq-item\">\n    <div class=\"jz-faq-q\">How do I initiate a custom pad development project with Jizhi?<\/div>\n    <div class=\"jz-faq-a\">Contact us at <a href=\"https:\/\/jeez-semicon.com\/de\/contact\/\" target=\"_blank\">jeez-semicon.com\/contact<\/a> with a brief description of: (1) the substrate material and wafer geometry; (2) the slurry chemistry you are using or planning to use; (3) your process targets (MRR, surface roughness, defect density); and (4) your CMP tool model. We will schedule an initial assessment call within 5 business days and issue a feasibility assessment and development proposal within 2\u20133 weeks of the call. An NDA is signed before any technical details are shared.<\/div>\n  <\/div>\n<\/div>\n\n<div class=\"jz-related\">\n  <div class=\"jz-related-title\">\ud83d\udcda Continue Reading<\/div>\n  <div class=\"jz-related-grid\">\n    <div class=\"jz-related-item\"><div class=\"jz-related-cat\">PILLAR<\/div><a href=\"https:\/\/jeez-semicon.com\/de\/blog\/CMP-Polishing-Pads-The-Complete-Guide\/\" target=\"_blank\">CMP Polishing Pads: The Complete Guide<\/a><\/div>\n    <div class=\"jz-related-item\"><div class=\"jz-related-cat\">MATERIALS<\/div><a href=\"https:\/\/jeez-semicon.com\/de\/blog\/CMP-Pad-Materials-Polyurethane-vs-Other-Options\/\" target=\"_blank\">CMP Pad Materials: Polyurethane vs Other Options<\/a><\/div>\n    <div class=\"jz-related-item\"><div class=\"jz-related-cat\">APPLICATIONS<\/div><a href=\"https:\/\/jeez-semicon.com\/de\/blog\/SiC-CMP-Polishing-Pads-for-Third-Generation-Semiconductors\/\" target=\"_blank\">SiC CMP Polishing Pads for Third-Generation Semiconductors<\/a><\/div>\n    <div class=\"jz-related-item\"><div class=\"jz-related-cat\">ENGINEERING<\/div><a href=\"https:\/\/jeez-semicon.com\/de\/blog\/CMP-Pad-Groove-Design-and-Slurry-Distribution\/\" target=\"_blank\">CMP Pad Groove Design and Slurry Distribution<\/a><\/div>\n    <div class=\"jz-related-item\"><div class=\"jz-related-cat\">APPLICATIONS<\/div><a href=\"https:\/\/jeez-semicon.com\/de\/blog\/Semiconductor-CMP-Polishing-Pads\/\" target=\"_blank\">Semiconductor CMP Polishing Pads<\/a><\/div>\n    <div class=\"jz-related-item\"><div class=\"jz-related-cat\">PROCUREMENT<\/div><a href=\"https:\/\/jeez-semicon.com\/de\/blog\/CMP-Polishing-Pad-Price-Factors-and-Buying-Guide\/\" target=\"_blank\">CMP Polishing Pad Price Factors and Buying Guide<\/a><\/div>\n  <\/div>\n<\/div>\n\n<div class=\"jz-cta-banner\">\n  <h2>Your Process Is Unique. Your Pad Should Be Too.<\/h2>\n  <p>Jizhi Electronic Technology provides full custom CMP polishing pad development \u2014 from groove pattern modification to ground-up formulation for novel substrates. Contact our R&amp;D team to begin your feasibility assessment. NDA and development proposal within 3 weeks.<\/p>\n  <a class=\"jz-btn jz-btn-white\" href=\"https:\/\/jeez-semicon.com\/de\/semi-categories\/polishing-pad\/\" target=\"_blank\">Browse Standard Pad Range<\/a>\n  <a class=\"jz-btn jz-btn-outline\" href=\"https:\/\/jeez-semicon.com\/de\/contact\/\" target=\"_blank\">Start Custom Pad Development<\/a>\n<\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>Back to CMP Polishing Pads: The Complete Guide Jizhi Electronic Technology \u2014 Customization Series A complete guide to custom CMP polishing pad development at Jizhi Electronic Technology \u2014 covering when  &#8230;<\/p>","protected":false},"author":1,"featured_media":1820,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[9,59],"tags":[],"class_list":["post-1801","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-blog","category-industry"],"acf":[],"_links":{"self":[{"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/posts\/1801","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/comments?post=1801"}],"version-history":[{"count":2,"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/posts\/1801\/revisions"}],"predecessor-version":[{"id":1803,"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/posts\/1801\/revisions\/1803"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/media\/1820"}],"wp:attachment":[{"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/media?parent=1801"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/categories?post=1801"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/jeez-semicon.com\/de\/wp-json\/wp\/v2\/tags?post=1801"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}