{"id":1899,"date":"2026-04-22T13:14:20","date_gmt":"2026-04-22T05:14:20","guid":{"rendered":"https:\/\/jeez-semicon.com\/?post_type=semiconductor&p=1899"},"modified":"2026-04-22T13:49:17","modified_gmt":"2026-04-22T05:49:17","slug":"ln-lt-slurry","status":"publish","type":"semiconductor","link":"https:\/\/jeez-semicon.com\/fr\/semiconductor\/ln-lt-slurry\/","title":{"rendered":"LN\/LT Slurry"},"content":{"rendered":"

Product Description<\/strong><\/h2>\n\n\n\n

A chemical mechanical polishing slurry \/ slurry formulation developed for the semiconductor industry and for lithium tantalate \/ lithium niobate crystal wafer processing, suitable for high-efficiency planarization in precision and ultra-precision applications of LiTaO\u2083 \/ LiNbO\u2083. It is designed to improve the material removal rate of lithium tantalate (LiTaO\u2083) and lithium niobate (LiNbO\u2083) wafers, reduce surface roughness, and achieve an ultra-smooth surface.<\/p>\n\n\n\n

Caract\u00e9ristiques du produit<\/strong><\/h2>\n\n\n\n

A \u201ctwo-component\u201d polishing slurry suitable for lithium tantalate (LT) and lithium niobate (LN) substrates.
The polishing slurry JZ-4904 demonstrates excellent performance under high-pressure and high-speed CMP conditions, with the following features:<\/strong><\/p>\n\n\n\n

Achieves higher removal rates and better planarization in a shorter time.
Suitable not only for composite substrates but also for single substrates.
Excellent particle removal, resulting in extremely low particle count after CMP, eliminating the need for additional RCA cleaning.<\/p>\n\n\n

\n
\"Grinding<\/figure>\n<\/div>\n\n
\n
\"LT<\/figure>\n<\/div>\n\n\n

Features of JIZHI Electronics Lithium Niobate (LiNbO\u2083) Polishing Slurry<\/strong><\/h2>\n\n\n\n
    \n
  1. High-performance CMP polishing slurry for large-scale manufacturing of LiNbO\u2083 wafers.<\/li>\n\n\n\n
  2. Synthesized through a special process, with spherical, monodispersed nanoparticles of uniform size and narrow particle size distribution, enabling high-quality polishing precision.<\/li>\n\n\n\n
  3. Achieves high removal rates with no subsurface damage and provides excellent stability.<\/li>\n\n\n\n
  4. pH, particle size, and stable ion content can be customized according to requirements.<\/li>\n\n\n\n
  5. Compatible with various polishing pads for polishing applications.<\/li>\n<\/ol>\n\n\n\n

    Basic Properties of JZ-4904<\/strong><\/h2>\n\n\n\n\n \n \n \n \n \n \n \n \n \n \n
    Product<\/th>\n JZ-4904<\/th>\n <\/tr>\n \n \n
    Model<\/td>\n JZ-4904A Solution<\/td>\n JZ-4904B Solution<\/td>\n <\/tr>\n \n \n
    Appearance<\/td>\n Liquid \u2013 White<\/td>\n Transparent<\/td>\n <\/tr>\n \n \n
    Densit\u00e9<\/td>\n 1.28g\/cm\u00b3<\/td>\n 1.01g\/cm\u00b3<\/td>\n <\/tr>\n \n \n
    Slurry Particle Size<\/td>\n 50nm<\/td>\n \/<\/td>\n <\/tr>\n \n \n
    pH Value<\/td>\n 10<\/td>\n 1.1<\/td>\n <\/tr>\n \n \n
    USE<\/td>\n Mixing Ratio<\/td>\n DI Water : Solution B : Solution A = 10 : 1.5 : 3.5<\/td>\n <\/tr>\n \n \n
    Color<\/td>\n Light Yellow<\/td>\n <\/tr>\n \n <\/table>\n\n\n\n

    JZ-4904 Polishing Experiment \u2013 Processing Conditions 1<\/strong><\/h2>\n\n\n\n\n \n \n \n \n \n \n \n \n \n \n \n
    Polishing Machine<\/th>\n Tokyo Seimitsu
    CMP Equipment: Champ<\/th>\n <\/tr>\n \n \n
    Product<\/td>\n 4-inch LT Wafer<\/td>\n <\/tr>\n \n \n
    Tampon de polissage<\/td>\n 1C1400<\/td>\n <\/tr>\n \n \n
    Pressure<\/td>\n 2 psi (low pressure)<\/td>\n <\/tr>\n \n \n
    Platen Speed<\/td>\n 60 rpm<\/td>\n <\/tr>\n \n \n
    Polishing Time<\/td>\n 5 min<\/td>\n <\/tr>\n \n \n
    Flow Rate<\/td>\n 150 mL\/min (one-way)<\/td>\n <\/tr>\n \n \n
    Removal Rate<\/td>\n 0.42 \u03bcm\/min<\/td>\n <\/tr>\n \n \n
    Surface Roughness<\/td>\n < 0.3 nm<\/td>\n <\/tr>\n \n <\/table>\n\n\n
    \n
    \"LT<\/figure>\n<\/div>\n\n\n

    Preparation of JZ~4904 Polishing Liquid<\/strong><\/h2>\n\n\n
    \n
    \"LT<\/figure>\n<\/div>\n\n\n

    Storage Method for JIZHI Electronics SiC Silicon Carbide Polishing Slurry<\/strong><\/h2>\n\n\n\n

    Stocker dans un entrep\u00f4t bien ventil\u00e9, frais et sec. Le produit doit \u00eatre stock\u00e9 \u00e0 une temp\u00e9rature comprise entre 5 et 35 \u00b0C, \u00e0 l'abri de la lumi\u00e8re directe du soleil et du gel. S'il est stock\u00e9 \u00e0 une temp\u00e9rature inf\u00e9rieure \u00e0 0 \u00b0C, une agglom\u00e9ration irr\u00e9versible peut se produire, rendant le produit inutilisable.<\/p>\n\n\n\n

    Prix des liquides de polissage CMP \/ Slurry de JIZHI Electronics<\/strong><\/h2>\n\n\n\n

    Les boues de polissage des m\u00e9taux CMP de JIZHI Electronics sont fabriqu\u00e9es \u00e0 l'aide de technologies et d'\u00e9quipements de production avanc\u00e9s \u00e0 l'\u00e9tranger et sont formul\u00e9es avec des compositions chimiques sp\u00e9cialis\u00e9es. La qualit\u00e9 des boues de polissage de JIZHI Electronics est comparable \u00e0 celle de produits import\u00e9s similaires.<\/p>\n\n\n\n

    Gr\u00e2ce \u00e0 une production locale, les boues CMP de JIZHI Electronics offrent des d\u00e9lais de livraison courts, une haute qualit\u00e9 stable et des prix comp\u00e9titifs et rentables.<\/p>","protected":false},"excerpt":{"rendered":"

    Product Description A chemical mechanical polishing slurry \/ slurry formulation developed for the semiconductor industry and for lithium tantalate \/ lithium niobate crystal wafer processing, suitable for high-efficiency planarization in …<\/p>","protected":false},"featured_media":1909,"template":"","categories":[],"tags":[],"semicategories":[50],"class_list":["post-1899","semiconductor","type-semiconductor","status-publish","has-post-thumbnail","hentry","semicategories-polishing_slurry"],"acf":[],"_links":{"self":[{"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/semiconductor\/1899","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/semiconductor"}],"about":[{"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/types\/semiconductor"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/media\/1909"}],"wp:attachment":[{"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/media?parent=1899"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/categories?post=1899"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/tags?post=1899"},{"taxonomy":"semicategories","embeddable":true,"href":"https:\/\/jeez-semicon.com\/fr\/wp-json\/wp\/v2\/semicategories?post=1899"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}