{"id":1899,"date":"2026-04-22T13:14:20","date_gmt":"2026-04-22T05:14:20","guid":{"rendered":"https:\/\/jeez-semicon.com\/?post_type=semiconductor&p=1899"},"modified":"2026-04-22T13:49:17","modified_gmt":"2026-04-22T05:49:17","slug":"ln-lt-slurry","status":"publish","type":"semiconductor","link":"https:\/\/jeez-semicon.com\/ja\/semiconductor\/ln-lt-slurry\/","title":{"rendered":"LN\/LT Slurry"},"content":{"rendered":"

Product Description<\/strong><\/h2>\n\n\n\n

A chemical mechanical polishing slurry \/ slurry formulation developed for the semiconductor industry and for lithium tantalate \/ lithium niobate crystal wafer processing, suitable for high-efficiency planarization in precision and ultra-precision applications of LiTaO\u2083 \/ LiNbO\u2083. It is designed to improve the material removal rate of lithium tantalate (LiTaO\u2083) and lithium niobate (LiNbO\u2083) wafers, reduce surface roughness, and achieve an ultra-smooth surface.<\/p>\n\n\n\n

\u88fd\u54c1\u306e\u7279\u5fb4<\/strong><\/h2>\n\n\n\n

A \u201ctwo-component\u201d polishing slurry suitable for lithium tantalate (LT) and lithium niobate (LN) substrates.
The polishing slurry JZ-4904 demonstrates excellent performance under high-pressure and high-speed CMP conditions, with the following features:<\/strong><\/p>\n\n\n\n

Achieves higher removal rates and better planarization in a shorter time.
Suitable not only for composite substrates but also for single substrates.
Excellent particle removal, resulting in extremely low particle count after CMP, eliminating the need for additional RCA cleaning.<\/p>\n\n\n

\n
\"Grinding<\/figure>\n<\/div>\n\n
\n
\"LT<\/figure>\n<\/div>\n\n\n

Features of JIZHI Electronics Lithium Niobate (LiNbO\u2083) Polishing Slurry<\/strong><\/h2>\n\n\n\n
    \n
  1. High-performance CMP polishing slurry for large-scale manufacturing of LiNbO\u2083 wafers.<\/li>\n\n\n\n
  2. Synthesized through a special process, with spherical, monodispersed nanoparticles of uniform size and narrow particle size distribution, enabling high-quality polishing precision.<\/li>\n\n\n\n
  3. Achieves high removal rates with no subsurface damage and provides excellent stability.<\/li>\n\n\n\n
  4. pH, particle size, and stable ion content can be customized according to requirements.<\/li>\n\n\n\n
  5. Compatible with various polishing pads for polishing applications.<\/li>\n<\/ol>\n\n\n\n

    Basic Properties of JZ-4904<\/strong><\/h2>\n\n\n\n\n \n \n \n \n \n \n \n \n \n \n
    Product<\/th>\n JZ-4904<\/th>\n <\/tr>\n \n \n
    \u30e2\u30c7\u30eb<\/td>\n JZ-4904A Solution<\/td>\n JZ-4904B Solution<\/td>\n <\/tr>\n \n \n
    Appearance<\/td>\n Liquid \u2013 White<\/td>\n Transparent<\/td>\n <\/tr>\n \n \n
    \u5bc6\u5ea6<\/td>\n 1.28g\/cm\u00b3<\/td>\n 1.01g\/cm\u00b3<\/td>\n <\/tr>\n \n \n
    Slurry Particle Size<\/td>\n 50nm<\/td>\n \/<\/td>\n <\/tr>\n \n \n
    pH Value<\/td>\n 10<\/td>\n 1.1<\/td>\n <\/tr>\n \n \n
    USE<\/td>\n Mixing Ratio<\/td>\n DI Water : Solution B : Solution A = 10 : 1.5 : 3.5<\/td>\n <\/tr>\n \n \n
    Color<\/td>\n Light Yellow<\/td>\n <\/tr>\n \n <\/table>\n\n\n\n

    JZ-4904 Polishing Experiment \u2013 Processing Conditions 1<\/strong><\/h2>\n\n\n\n\n \n \n \n \n \n \n \n \n \n \n \n
    Polishing Machine<\/th>\n Tokyo Seimitsu
    CMP Equipment: Champ<\/th>\n <\/tr>\n \n \n
    Product<\/td>\n 4-inch LT Wafer<\/td>\n <\/tr>\n \n \n
    \u7814\u78e8\u30d1\u30c3\u30c9<\/td>\n 1C1400<\/td>\n <\/tr>\n \n \n
    \u5727\u529b<\/td>\n 2 psi (low pressure)<\/td>\n <\/tr>\n \n \n
    Platen Speed<\/td>\n 60 rpm<\/td>\n <\/tr>\n \n \n
    Polishing Time<\/td>\n 5 min<\/td>\n <\/tr>\n \n \n
    Flow Rate<\/td>\n 150 mL\/min (one-way)<\/td>\n <\/tr>\n \n \n
    \u9664\u53bb\u7387<\/td>\n 0.42 \u03bcm\/min<\/td>\n <\/tr>\n \n \n
    \u8868\u9762\u7c97\u3055<\/td>\n < 0.3 nm<\/td>\n <\/tr>\n \n <\/table>\n\n\n
    \n
    \"LT<\/figure>\n<\/div>\n\n\n

    Preparation of JZ~4904 Polishing Liquid<\/strong><\/h2>\n\n\n
    \n
    \"LT<\/figure>\n<\/div>\n\n\n

    JIZHI\u30a8\u30ec\u30af\u30c8\u30ed\u30cb\u30af\u30b9SiC\u70ad\u5316\u30b1\u30a4\u7d20\u7814\u78e8\u30b9\u30e9\u30ea\u30fc\u306e\u4fdd\u7ba1\u65b9\u6cd5<\/strong><\/h2>\n\n\n\n

    \u63db\u6c17\u306e\u826f\u3044\u3001\u6dbc\u3057\u304f\u4e7e\u71e5\u3057\u305f\u5009\u5eab\u3067\u4fdd\u7ba1\u3059\u308b\u3053\u3068\u3002\u88fd\u54c1\u306f\u76f4\u5c04\u65e5\u5149\u3068\u51cd\u7d50\u3092\u907f\u3051\u30015\uff5e35\u2103\u3067\u4fdd\u7ba1\u3059\u308b\u3053\u3068\u30020 \u00b0C\u4ee5\u4e0b\u3067\u4fdd\u7ba1\u3059\u308b\u3068\u3001\u4e0d\u53ef\u9006\u7684\u306a\u51dd\u96c6\u304c\u8d77\u3053\u308a\u3001\u88fd\u54c1\u304c\u4f7f\u7528\u3067\u304d\u306a\u304f\u306a\u308b\u3053\u3068\u304c\u3042\u308b\u3002.<\/p>\n\n\n\n

    JIZHI\u30a8\u30ec\u30af\u30c8\u30ed\u30cb\u30af\u30b9CMP\/\u30b9\u30e9\u30ea\u30fc\u7814\u78e8\u6db2\u306e\u4fa1\u683c<\/strong><\/h2>\n\n\n\n

    JIZHI\u30a8\u30ec\u30af\u30c8\u30ed\u30cb\u30af\u30b9\u306eCMP\u7528\u91d1\u5c5e\u7814\u78e8\u30b9\u30e9\u30ea\u30fc\u306f\u3001\u6d77\u5916\u306e\u9ad8\u5ea6\u306a\u751f\u7523\u6280\u8853\u3068\u8a2d\u5099\u306b\u3088\u308a\u88fd\u9020\u3055\u308c\u3001\u7279\u6b8a\u306a\u5316\u5b66\u7d44\u6210\u3067\u8abf\u5408\u3055\u308c\u3066\u3044\u307e\u3059\u3002\u8f38\u5165\u54c1\u3068\u6bd4\u8f03\u3057\u3066\u3082\u905c\u8272\u306e\u306a\u3044\u54c1\u8cea\u3067\u3059\u3002.<\/p>\n\n\n\n

    \u73fe\u5730\u751f\u7523\u306b\u3088\u308a\u3001JIZHI\u30a8\u30ec\u30af\u30c8\u30ed\u30cb\u30af\u30b9\u306eCMP\u30b9\u30e9\u30ea\u30fc\u306f\u3001\u77ed\u7d0d\u671f\u3001\u5b89\u5b9a\u3057\u305f\u9ad8\u54c1\u8cea\u3001\u7af6\u4e89\u529b\u306e\u3042\u308b\u8cbb\u7528\u5bfe\u52b9\u679c\u306e\u9ad8\u3044\u4fa1\u683c\u8a2d\u5b9a\u3092\u5b9f\u73fe\u3057\u3066\u3044\u307e\u3059\u3002.<\/p>","protected":false},"excerpt":{"rendered":"

    Product Description A chemical mechanical polishing slurry \/ slurry formulation developed for the semiconductor industry and for lithium tantalate \/ lithium niobate crystal wafer processing, suitable for high-efficiency planarization in …<\/p>","protected":false},"featured_media":1909,"template":"","categories":[],"tags":[],"semicategories":[50],"class_list":["post-1899","semiconductor","type-semiconductor","status-publish","has-post-thumbnail","hentry","semicategories-polishing_slurry"],"acf":[],"_links":{"self":[{"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/semiconductor\/1899","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/semiconductor"}],"about":[{"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/types\/semiconductor"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/media\/1909"}],"wp:attachment":[{"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/media?parent=1899"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/categories?post=1899"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/tags?post=1899"},{"taxonomy":"semicategories","embeddable":true,"href":"https:\/\/jeez-semicon.com\/ja\/wp-json\/wp\/v2\/semicategories?post=1899"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}