Barium fluoride crystal polishing liquid, BaF2 chemical mechanical polishing liquid

The function of barium fluoride crystal CMP polishing liquid

Jizhi Electronics has specially developed and designed a chemical mechanical polishing (CMP) slurry for barium fluoride (BaF2) crystals. Through the synergistic effect of nano-scale abrasives and chemical additives, it achieves ultra-smooth and low-damage processing of the crystal surface, meeting the high-end demands of infrared optics, ultraviolet windows, nuclear radiation detection and other fields.

Product Features

• Ultra-precision polishing
  The surface roughness (Ra) is ≤ 0.5 nm, achieving atomic-level flatness.
  The removal rate is controllable (0.1 – 1.5 μm/min), suitable for different process stages.
• Low-defect process
  Nano-scale silica/cerium oxide composite abrasive, reducing scratches and subsurface damage.
  The pH value is stable (8.0 – 10.5), preventing crystal corrosion or hydrolysis.
• High material compatibility
  Optimize the formula to suit the characteristics of barium fluoride crystals, avoiding the loss of fluorine elements and surface fogging.
• Environmental protection and safety
  Heavy metal-free, low VOC emissions, and in compliance with RoHS 2.0 standards.
  Waste liquid is easy to handle, reducing environmental protection costs.