Acero al tungsteno
Ensuring surface gloss and right angles is a key challenge in tungsten steel polishing. Tungsten steel is primarily used for tools and cutting blades, so the sharpness of its edges ...
Lechada para pulido de metales - Lechada para pulido de espejos con logotipo de Apple
The Apple Logo is highly tactile, with its sparkling mirror-like effect showcasing the charm and aesthetic of the Apple brand. The creation of a perfect Apple Logo requires polishing through ...
Lechada de pulido de jade-Proceso de pulido CMP para esferas de reloj de jade
A jade wristwatch designed by a client exudes elegance and sophistication, embodying the noble character of jade. The rough surface removal and polishing of the Hetian jade dial are achieved ...
Semiconductor Polishing Slurry-Ceramic Copper-Clad Substrate DPC Polishing Slurry / DBC Grinding Fluid
Gizhil Electronic's ceramic copper-clad substrate grinding fluid / DPC polishing slurry / DBC grinding fluid typically involves two processes: coarse polishing and fine polishing. Depending on the customer's requirements for ...
Lechada para pulido de metales-Pulido CMP de placas de retorno de componentes hidráulicos / placas de nueve orificios
The power components of hydraulic systems are driven by engines or motors, which draw oil from the hydraulic tank, generate pressurized oil, and deliver it to the actuators. Hydraulic pumps ...
Esmerilado y pulido de obleas de zafiro
The purpose of polishing sapphire wafers is to reduce the final thickness of the substrate to the desired target value, achieving a TTV (Total Thickness Variation) of better than ±2 ...
Lechada para pulido de aleaciones de aluminio - Pulido espejo para piezas de aluminio
Aluminum alloy is relatively soft and has low hardness, making it highly susceptible to mechanical damage such as scratches and abrasions during processing, as well as corrosion and poor chemical ...
Lechada de pulido de obleas de carburo de silicio
Gizhil Electronic's silicon carbide fine polishing slurry is suitable for the surface planarization of SiC silicon carbide wafer substrates during precision machining. The slurry used for wafer polishing exhibits high ...
Lechada de pulido de aleaciones duras-Pulido espejo de cuchillas de acero al tungsteno
Hard alloy blades possess a series of excellent properties, including high hardness, good toughness, heat resistance, and corrosion resistance. Particularly, their high hardness and wear resistance allow them to maintain ...
Proceso de pulido del carburo de silicio (SiC)
Depending on the specific semiconductor industry processes, CMP (Chemical Mechanical Polishing) slurries can be categorized into dielectric layer CMP slurries, barrier layer CMP slurries, copper CMP slurries, silicon CMP slurries, ...
