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Jusqu'à présent, semiconductor a créé 263 entrées de blog.

Boues de polissage des métaux - Boues de polissage des miroirs du logo Apple

The Apple Logo is highly tactile, with its sparkling mirror-like effect showcasing the charm and aesthetic of the Apple brand. The creation of a perfect Apple Logo requires polishing through ...

Par |2025-12-16T11:39:06+08:002025年12月9日|Application|Commentaires fermés sur Metal Polishing Slurry — Apple Logo Mirror Polishing Slurry

Boues de polissage Jade - Processus de polissage CMP pour les cadrans de montres Jade

A jade wristwatch designed by a client exudes elegance and sophistication, embodying the noble character of jade. The rough surface removal and polishing of the Hetian jade dial are achieved ...

Par |2025-12-16T11:39:26+08:002025年12月9日|Application|Commentaires fermés sur Jade Polishing Slurry—CMP Polishing Process for Jade Watch Dials

Boues de polissage pour semi-conducteurs - Substrats en céramique, cuivre et laiton Boues de polissage DPC / Fluide de prépolissage DBC

Gizhil Electronic's ceramic copper-clad substrate grinding fluid / DPC polishing slurry / DBC grinding fluid typically involves two processes: coarse polishing and fine polishing. Depending on the customer's requirements for ...

Par |2025-12-16T11:39:57+08:002025年12月9日|Application|Commentaires fermés sur Semiconductor Polishing Slurry—Ceramic Copper-Clad Substrate DPC Polishing Slurry / DBC Grinding Fluid

Boues de polissage des métaux - Polissage CMP des plaques de retour des composants hydrauliques / plaques à neuf trous

The power components of hydraulic systems are driven by engines or motors, which draw oil from the hydraulic tank, generate pressurized oil, and deliver it to the actuators. Hydraulic pumps ...

Par |2025-12-16T11:42:04+08:002025年12月9日|Application|Commentaires fermés sur Metal Polishing Slurry—CMP Polishing of Hydraulic Component Return Plates / Nine-Hole Plates

Prépolissage et polissage de plaquettes de saphir

The purpose of polishing sapphire wafers is to reduce the final thickness of the substrate to the desired target value, achieving a TTV (Total Thickness Variation) of better than ±2 ...

Par |2025-12-16T11:42:41+08:002025年12月9日|Application|Commentaires fermés sur Sapphire Wafer Grinding and Polishing

Boues de polissage d'alliages d'aluminium - Polissage miroir de pièces en aluminium

Aluminum alloy is relatively soft and has low hardness, making it highly susceptible to mechanical damage such as scratches and abrasions during processing, as well as corrosion and poor chemical ...

Par |2025-12-16T11:43:07+08:002025年12月9日|Application|Commentaires fermés sur Aluminum Alloy Polishing Slurry — Mirror Polishing for Aluminum Workpieces

Silicon Carbide Wafer Polishing Slurry

Gizhil Electronic's silicon carbide fine polishing slurry is suitable for the surface planarization of SiC silicon carbide wafer substrates during precision machining. The slurry used for wafer polishing exhibits high ...

Par |2025-12-16T11:43:32+08:002025年12月9日|Application|Commentaires fermés sur Silicon Carbide Wafer Polishing Slurry

Hard Alloy Polishing Slurry—Mirror Polishing of Tungsten Steel Blades

Hard alloy blades possess a series of excellent properties, including high hardness, good toughness, heat resistance, and corrosion resistance. Particularly, their high hardness and wear resistance allow them to maintain ...

Par |2025-12-16T11:43:53+08:002025年12月9日|Application|Commentaires fermés sur Hard Alloy Polishing Slurry—Mirror Polishing of Tungsten Steel Blades
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