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Gizhil Electronic’s silicon carbide fine polishing slurry is suitable for the surface planarization of SiC silicon carbide wafer substrates during precision machining. The slurry used for wafer polishing exhibits high ...

硬質合金ブレードは、高硬度、良好な靭性、耐熱性、耐食性など、一連の優れた特性を持っています。特に、高い硬度と耐摩耗性により、...

CMP（化学的機械研磨）スラリーは、半導体産業のプロセスに応じて、誘電体層CMPスラリー、バリア層CMPスラリー、銅CMPスラリー、シリコンCMPスラリー、...に分類することができます。.

Polishing the stainless steel back cover of a smart watch requires both the rough and fine polishing stages of the CMP process. Using Jizhi Electronics’ polishing slurry and pads in ...

Achieving a mirror finish on alumina ceramic sheets presents significant challenges for two main reasons: first, the high hardness of alumina makes it difficult to grind; second, its strong light-absorbing ...

Traditional processes for achieving high-quality mirror finishes on stainless steel primarily employ polishing technologies such as electrochemical polishing, chemical polishing, and mechanical polishing. With increasing demands for the surface quality ...