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Gizhil Electronic’s silicon carbide fine polishing slurry is suitable for the surface planarization of SiC silicon carbide wafer substrates during precision machining. The slurry used for wafer polishing exhibits high ...

Hard alloy blades possess a series of excellent properties, including high hardness, good toughness, heat resistance, and corrosion resistance. Particularly, their high hardness and wear resistance allow them to maintain ...

Depending on the specific semiconductor industry processes, CMP (Chemical Mechanical Polishing) slurries can be categorized into dielectric layer CMP slurries, barrier layer CMP slurries, copper CMP slurries, silicon CMP slurries, ...

Polishing the stainless steel back cover of a smart watch requires both the rough and fine polishing stages of the CMP process. Using Jizhi Electronics’ polishing slurry and pads in ...

Achieving a mirror finish on alumina ceramic sheets presents significant challenges for two main reasons: first, the high hardness of alumina makes it difficult to grind; second, its strong light-absorbing ...

Traditional processes for achieving high-quality mirror finishes on stainless steel primarily employ polishing technologies such as electrochemical polishing, chemical polishing, and mechanical polishing. With increasing demands for the surface quality ...