CMPウェーハ研磨用スラリーの特性と選択ガイド
In the global planarization stage of wafer manufacturing, Chemical Mechanical Polishing (CMP) is a critical process. As a core consumable, CMP polishing slurry directly determines key wafer surface metrics such ...
スマートウォッチステンレス裏蓋研磨
Polishing the stainless steel back cover of a smart watch requires both the rough and fine polishing stages of the CMP process. Using Jizhi Electronics' polishing slurry and pads in ...
研磨スラリーによるアルミナセラミックスの鏡面研磨
Achieving a mirror finish on alumina ceramic sheets presents significant challenges for two main reasons: first, the high hardness of alumina makes it difficult to grind; second, its strong light-absorbing ...
ステンレス鋼表面の高速研磨用CMP
Traditional processes for achieving high-quality mirror finishes on stainless steel primarily employ polishing technologies such as electrochemical polishing, chemical polishing, and mechanical polishing. With increasing demands for the surface quality ...
CMP技術紹介
CMP（Chemical Mechanical Polishing：化学的機械研磨）は現在、近代的な工業製造において、ワークピースの表面研磨や、集積回路製造におけるウェーハ表面のグローバルな平坦化に使用されている唯一の技術である。CMP ...
